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Scanning Electron Microscopy
surface imaging from 1 to 5 nm in size.
See Also: Scanning Electron Microscopes, SEM
- Kreon Technologies
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Microscopy
Microscopy is the technical field of using microscopes to view objects and areas of objects that cannot be seen with the naked eye. There are three well-known branches of microscopy: optical, electron, and scanning probe microscopy, along with the emerging field of X-ray microscopy.
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Scanning Electron Microscopy
SEM
Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Cross Sections and Metallography
Rocky Mountain Laboratories, Inc.
Cross sections are prepared by mounting samples in epoxy and then grinding and polishing the mount for imaging in the optical microscope or Scanning Electron Microscopy (SEM). Valuable information from cross sectioning can include: film thicknesses, inclusions, corrosion thickness, dimensional verification, and subsurface defects. Metallographic cross sections are typically etched to reveal the microstructure. Microstructural analysis can provide information about heat treatment history, corrosion susceptibility, as well as undesirable microconstituents.
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Sputter Coater & Freeze Fracture Solutions
To obtain high-quality images of samples with scanning (SEM) or transmission electron microscopy (TEM), your samples need to be conductive to avoid charging. If a sample does not have a high enough conductivity, then you can quickly cover it with a conductive layer using the method of sputter coating. Also, a carbon or e-beam evaporator coating can be used. Such coatings protect the sample, allow enhancing of the EM image contrast, or can act as a TEM-grid support film for small scale samples.
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Scanning Electron Microscopy (SEM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning Electron Microscopy (SEM Analysis) can produce images of almost any sample at magnifications of 15-300,000X. The SEM has tremendous depth of field allowing for imaging that cannot be accomplished using optical microscopy. Conductive and nonconductive samples can be imaged. When operated in the backscatter (BSE) detection mode, differences in material composition can be observed. Elemental analysis can be performed on any feature observed with an integrated Energy Dispersive Spectroscopy (EDS) detector.
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X-Ray Photoelectron Spectrometer
AXIS Supra
AXIS SupraTM is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterisation. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode. XPS spectroscopy and imaging results can be complemented by additional surface analysis techniques such as: ultraviolet photoemission spectroscopy (UPS); Schottky field emission scanning Auger microscopy (SAM) and secondary electron microscopy (SEM) and ion scattering spectroscopy (ISS). The AXIS Supra replaces the AXIS Ultra DLD as Kratos' flagship x-ray photoelectron spectrometer.
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Analytical Services
IGC: Inverse Gas Chromatography; Understand surface energies, polarities, acid/base properties and nanomorphology on powders and fibers. ToF-SIMS: Time-of-Flight Secondary Ion Mass Spectrometry. Localize your molecules at the first nanos! 2D imaging with resolution up to 200 nm. Highest sensitivity up to 10 ppm. CM: Quarz Crystal Microbalance In-situ observation of thickness and stiffness of any films in liquid environmentSEM: Scanning Electron Microscopy Images say more than words, especially with an artistic eye XPS/ESCA: X-ray Photoelectron Spectroscopy/Electron Spectroscopy for Chemical Analysis.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Scanning Electron Microscopes
Our Scanning Electron Microscopes (SEMs) resolve features from the optical regime down to the sub-nanometer length scale.
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Real-Time X-Ray Imaging and Variable Pressure Scanning Electron Microscope
Trialon has the equipment and experienced staff to operate this highly technical piece of laboratory equipment. Our state-of-the-art materials analysis lab located in Auburn Hills, MI is managed by a Ph.D with over 20 years of hands-on experience in root cause failure analysis of design, material and process for current and future products.
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Scanning Electron Microscope w/ EDX Laboratory
Trialon has the equipment and experienced staff to operate this highly technical piece of laboratory equipment. Our state-of-the-art materials analysis lab located in Auburn Hills, MI is managed by a Ph.D with over 20 years of hands-on experience in root cause failure analysis of design, material and process for current and future products.
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X-ray Microscopy
Xradia Family
✔ Characterize the properties and behaviors of your materials non-destructively.✔ Reveal details of microstructures in three dimensions (3D).✔ Develop and confirm models or visualize structural details.✔ Achieve high contrast and submicron resolution imaging even for relatively large samples.
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Optical microscopy (OM)
Materials Analysis Technology Inc.
Optical microscopy is used to display the surface morphology of samples by 2D intensity contrast due to deflection and reflection of visible light shined on areas of interest. Its resolution is about half of the incident wavelength, which is ~0.2 μm for visible light (wavelength of 400-700 nm). Such resolution limits the maximum magnification to X1000, and thus optical microscopy provides preliminary inspection of sample surface structure.
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Electron Spectrometers
SPECS Surface Nano Analysis GmbH
Nanotechnology is focused on the engineering and the physical properties of small structures. Therefore techniques that have sensitivities at a scale of 0.1 nm to 100 nm are required to study these structures. Different methods of electron spectroscopy (XPS, UPS and AES) have a sensitivity in this range and are therefore key techniques in nanoscience.Thanks to our high level of expertise in electron optics and electronics we can offer electron spectrometers with the highest resolution and transmission possible.
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Electron Microscope Analyzers
Bruker’s electron microscope analyzers EDS, WDS, EBSD and Micro-XRF on SEM offer the most comprehensive compositional and structural analysis of materials available today. The full integration of all these techniques into the ESPRIT software allows you to easily combine data obtained by these complementary methods for best results.
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Scanning Electrochemical Systems
The VersaSCAN is a single platform capable of providing spatial resolution to both electrochemical and materials-based measurements. Each VersaSCAN is based on a common high-resolution, long-travel, closed-loop positioning system mounted to a vibration-resistant optical base. Different auxiliary pieces are mounted to the positioning system. These ancillary pieces (e.g., an electrometer, piezo vibration unit, or a laser sensor) provide functionality to the positioning system for different scanning probe experiments. VersaSTAT potentiostats and Signal Recovery Lock-in Amplifiers are integrated via ethernet control to make accurate measurements of these small signals.
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Light Microscopy
Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Scanning XPS Microprobe
PHI Quantera II
The core technology of the PHI Quantera II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling, and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 7.5 µm. In addition to superior XPS performance characteristics the PHI Quantera II provides two in situ sample parking stations which enables the automated analysis of all three sample platens in a single user defined analysis queue.
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Renishaw Scanning Probes
Advanced Industrial Measurement Systems
The REVO® is designed to maximize CMM throughput while maintaining high system accuracy and uses synchronized motion as well as Renscan5 measurement technology to minimize the dynamic effects of CMM motion at ultra high measurement speeds. This is achieved by letting the REVO® head do the fast demanding motion while the CMM moves in a slow linear fashion.
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Electron Microscope Analyzer
QUANTAX EBSD
QUANTAX EBSD system, with its popular OPTIMUS 2 detector head, is the best available solution for analyzing nanomaterials in the SEM
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Scanning Probe Microscopy
SPECS Surface Nano Analysis GmbH
As Scanning Probe Microscopy (SPM) is a key tool for nanotechnology, SPECS offers dedicated solutions for highly demanding requirements.In UHV, strong emphasis lies on spectroscopic methods such as scanning tunneling spectroscopy and inelastic tunneling spectroscopy as well as single atom and molecule manipulation. With the invention of a Joule-Thomson cryostat by Prof. Wulf Wulfhekel, SPECS now offers the JT-STM , operating sample and sensors in thermal equilibrium below 1K with optional high magnetic field.
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Scanning Droplet Cell
VS-SDC
Scanning Droplet System (SDC) uses a compact peristaltic pump to force electrolyte through a small diameter tube and into a specifically designed head. This PTFE-based SDC head is machined to allow electrolyte to flow past an installed Reference Electrode and then to a port at the base of the head.
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Laser Scanning Microscopes
The Olympus FLUOVIEW confocal microscopes are designed for high-resolution, confocal observation of both fixed and living cells, enabling visualization deep within samples. From the New FV3000, optimized for the most robust interactive live cell and tissue experiments, to easy-to-use high content imaging, explore the wide range of options with Olympus exclusive optical technologies.
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Imaging Scanning Monochromator
H1034
HORIBA Scientific OEM has developed a high-throughput imaging scanning monochromator based on an aberration-corrected concave holographic grating with low stray light and high efficiency. This proprietary layout with single optics design is ideal for imaging for low-light applications. It features a 3-position external filter wheel, TTL drive electronics, 4-phase stepper motor and associated worm/gear 90:1 ratio mechanism, encoded, aligned and focused at factory.
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Laser Scanning FLIM Microscopes
DCS-120 laser scanner: Compact - Flexible - Precise. As technology leader in equipment and techniques for single photon counting, Becker & Hickl offers the DCS-120 systems that are complete laser scanning microscopes for fluorescence lifetime imaging (FLIM) since 2007. The systems use bh’s multi-dimensional TCSPC FLIM technology in combination with fast laser scanning and confocal detection or multi-photon excitation.
