MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive,
Suite 201
Andover, MA 01810
United States
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High-concentration, High Flow Ozone Generator
SEMOZON® AX8407
The SEMOZON AX8407 generator converts pure oxygen into ozone through silent electrical discharge and achieves high output and high concentration level. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the presence of contaminants, e.g. NOx compounds, is extremely low.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Stand-alone Ozone Delivery System For Advanced Processes
SEMOZON® AX8585
SEMOZON® AX8585 stand-alone ozone gas delivery system is designed around the AX8410 PRIME ozone generator to provide high flow, high concentration, ultra clean ozone generation and delivery. This fully configurable product line is designed to meet the ever changing needs of the semiconductor industry. Each SEMOZON AX8585 is a fully integrated, high output ozone gas delivery system intended for use in an increasing number of semiconductor process applications such as ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, and oxide growth.
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High Power Microwave Plasma System
The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Programmable Industrial PC
HyperPAC
The HyperPAC Industrial PC programmable control solution delivers top of the line performance with reliable operation for a variety of control and automation tasks. Compared to standard IPCs, the HyperPAC provides a highly compact, fanless solution, with existing expandable IO via PCIe, along with flexibility to expand and configure the system. The HyperPAC is a flexible, scalable solution for numerous applications and project requirements which enables IIoT (Industrial Internet of Things) integration.
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High Accuracy In-Situ Mass Flow Verifier
HA-MFV
The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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AA06A Baratron® Absolute Pressure Sensor
AA06A Baratron® absolute pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Process Sense™ NDIR End Point Detector For Chamber Clean
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Industrial Absolute Pressure Transducers
These industrial Baratron® capacitance manometers feature absolute pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Ozonated Water Delivery System
LIQUOZON® DI-O3
MKS' LIQUOZON® DI-O3 is a dissolved ozone gas delivery system providing high purity ozone in ultrapure water for Semiconductor and Electronic Thin Film applications like contaminant removal and surface conditioning via wet clean or rinsing methods. The high redox potential of ozone causes rapid conversion back to oxygen making it an environmentally friendly alternative to other chemical processes.
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High Power Microwave Plasma Source
The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Dissolved Carbon Dioxide (DI-CO2) Ultrapure Water Delivery System
The DI-CO2 is used in single substrate cleaning tools for rinsing steps to prevent ESD effects and/or corrosion by creating UPW (ultrapure water) with precisely defined conductivity. It is a compact system for tool integration, providing conductive DI-CO2 water (Carbon Dioxide) with closed loop controlled conductivity. The conductivity is kept at a constant value under changing flow conditions by control of the CO2 concentration in the DI-CO2 water.
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Compact Ultrafast 50-50,000 sccm Mass Flow Controller/Meter
C-Series
The C-Series Mass Flow Controller (MFC) is a compact, fast-response model using a Micro-Electro-Mechanical Systems (MEMS) based flow sensor for non-corrosive gas applications. It is available in Full Scale flow rates from 50 sccm to 50 slm (N2 equivalent) with a control range from as low as 0.1% of Full Scale up to 100% of Full Scale and is also available as a flow meter. Analog (0 to 5 VDC) or digital (RS485 or Modbus TCP/IP) communications interfaces are available. Required power supply voltage is 24 VDC nominal.
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2450 MHz Industrial Microwave Generators
Alter® 2450 MHz Industrial Microwave Generators are built on MKS Alter® Product experience and designed with rugged and reliable switch mode power supplies for demanding industrial applications. They offer compact generators up to 3kW in a 19 inch standard rack with a remote head and integrated isolator.
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Residual Gas Analyzers
Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Newport Corporation
Newport is a brand within the MKS Instruments Light & Motion division. The Newport product portfolio consists of a full range of solutions including motion control, optical tables and vibration isolation systems, photonic instruments, optics and opto-mechanical components. Newport’s innovative solutions leverage core expertise in vibration isolation and sub-micron positioning systems, opto-mechanical and photonics subsystems, to enhance our customers’ capabilities and productivity in the semiconductor, industrial technologies, life and health sciences, and research and defense markets.
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Electro Scientific Industries, Inc.
Leveraging its innovative technical competencies, ESI's portfolio of micro-engineering solutions enhances manufacturing processes around the globe
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Newport Electronics
Newport Corporation, a wholly owned subsidiary of MKS Instruments, Inc. (NASDAQ: MKSI ), is a leading global supplier of advanced technology products and systems to customers in the scientific research, microelectronics, life and health sciences, industrial manufacturing and defense/security markets. Established in 1969, Newport has over 52 years of industry knowledge and expertise across a broad range of technologies allowing the company to continually deliver innovative products in the areas of lasers, photonics instrumentation, sub-micron positioning systems, vibration isolation, and optical components and subsystems to enhance the capabilities and productivity of its customers' manufacturing, engineering and research applications. In addition, Newport has built a strong history of partnering with OEM customers, delivering solutions from subassemblies to full solutions including design, testing and manufacturing.
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Ophir
Ophir is a brand within the MKS Instruments Light & Motion division. The Ophir product portfolio consists of laser and LED measurement products, including laser power and energy meters and laser beam profilers
